Polybenzyl methacrylate brush used in the top-down/ bottom-up approach for nanopatterning technology

Journal of Applied Polymer Science

Volumn 101, Issue 3, 2006, Pages 1953-1957

  Tsai, Yuhsin ^a   Wang, Wei Ching ^b  

^a INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

^b CHINA MEDICAL UNIVERSITY   (Taiwan)

Author keywords

Atom transfer radical polymerization (ATRP); Graft copolymers; Lithography; Nanotechnology; Surfaces

Indexed keywords

LITHOGRAPHY; NANOTECHNOLOGY; POLYMERIZATION; REACTION KINETICS; SCANNING ELECTRON MICROSCOPY; SURFACES;

ATOM-TRANSFER RADICAL POLYMERIZATION (ATRP); BENZYL METHACRYLATE (BZMA); FLASH IMPRINT LITHOGRAPHY; POLYBENZYL METHACRYLATE BRUSH;

GRAFT COPOLYMERS;

GRAFT COPOLYMER; GRAFTING; NANOTECHNOLOGY; POLYMER; POLYMERIZATION; SCANNING ELECTRON MICROSCOPY;

EID: 33746099703     PISSN: 00218995     EISSN: 10974628     Source Type: Journal    
DOI: 10.1002/app.23686     Document Type: Article

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