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The solidified reaction mixture was dissolved in dichloromethane, and the wafers were removed and washed by immersion in a beaker of tetrahydrofuran for 10 min followed by immersion in a beaker of dichloromethane for 1 h. The wafers were then placed in a Soxhlet apparatus and continuously extracted with refluxing dichloromethane for 24 h, removed, and dried under high vacumn for 24 h.
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