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Volumn 37, Issue 9, 2006, Pages 861-866

A new analytical model for optimizing SOI LDMOS with step doped drift region

Author keywords

LDMOS; RESURF; SOI; Step drift doping profile

Indexed keywords

ELECTRIC FIELDS; MATHEMATICAL MODELS; OPTIMIZATION; OXIDES; SILICON;

EID: 33745891796     PISSN: 00262692     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mejo.2006.03.004     Document Type: Article
Times cited : (43)

References (9)
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  • 2
    • 0033169522 scopus 로고    scopus 로고
    • An analytical model for interaction of SIPOS layer with underlying silicon of SOI RESURF devices
    • Chung S.K., and Shin D.K. An analytical model for interaction of SIPOS layer with underlying silicon of SOI RESURF devices. IEEE Trans. Electron. Dev. 46 (1999) 804-1807
    • (1999) IEEE Trans. Electron. Dev. , vol.46 , pp. 804-1807
    • Chung, S.K.1    Shin, D.K.2
  • 3
    • 0026403124 scopus 로고    scopus 로고
    • S. Merchant, E. Arnold, H. Baumgart, H. Pein, R. Pinker, Realization of high breakdown voltage (>700V) in thin soi devices, in: Proceedings of the International Symposium on Power Semiconductor Devices ICs, 1991, pp. 31-35.
  • 4
    • 0032686879 scopus 로고    scopus 로고
    • Numerical model of linear doping profiles for high-voltage thin-film SOI devices
    • Zhang S.D., Sin J.K.O., Laim T.M.L., and Ping K. Numerical model of linear doping profiles for high-voltage thin-film SOI devices. IEEE Trans. Electron. Dev. 46 5 (1999) 1036-1041
    • (1999) IEEE Trans. Electron. Dev. , vol.46 , Issue.5 , pp. 1036-1041
    • Zhang, S.D.1    Sin, J.K.O.2    Laim, T.M.L.3    Ping, K.4
  • 5
    • 0042229238 scopus 로고    scopus 로고
    • A high performance RF LDMOSFET in thin film SOI technology with step drift profile
    • Luo J., Cao G., Madathil S.N.E., and Souza M.M.D. A high performance RF LDMOSFET in thin film SOI technology with step drift profile. Solid-State Electron. 47 (2003) 1937-1941
    • (2003) Solid-State Electron. , vol.47 , pp. 1937-1941
    • Luo, J.1    Cao, G.2    Madathil, S.N.E.3    Souza, M.M.D.4
  • 7
    • 0029536592 scopus 로고    scopus 로고
    • R. Sunkavalli, A. Tamba, B.J. Baliga, Step drift doping profile for high voltage DI lateral power devices, in: Proceedings of the International SOI Conference, 1995, pp.139-140.
  • 8
    • 21644459943 scopus 로고    scopus 로고
    • L. Zhaoji, G. Yufeng, Z. Bo, F. Jian, L. Zehong, A new 2-D analytical model of double RESURF in SOI high voltage devices", in: Proceedings of the International Conference on Solid ICs Technology, 2004, pp. 328-331.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.