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Volumn 37, Issue 9, 2006, Pages 861-866
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A new analytical model for optimizing SOI LDMOS with step doped drift region
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Author keywords
LDMOS; RESURF; SOI; Step drift doping profile
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Indexed keywords
ELECTRIC FIELDS;
MATHEMATICAL MODELS;
OPTIMIZATION;
OXIDES;
SILICON;
LDMOS;
RESURF;
SOI;
STEP DRIFT DOPING PROFILE;
ELECTRIC BREAKDOWN;
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EID: 33745891796
PISSN: 00262692
EISSN: None
Source Type: Journal
DOI: 10.1016/j.mejo.2006.03.004 Document Type: Article |
Times cited : (43)
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References (9)
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