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Volumn 46, Issue 5, 1999, Pages 1036-1041

Numerical modeling of linear doping profiles for high-voltage thin-film SOI devices

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC BREAKDOWN OF SOLIDS; MATHEMATICAL MODELS; MOSFET DEVICES; POWER INTEGRATED CIRCUITS; SEMICONDUCTOR DOPING; SILICON ON INSULATOR TECHNOLOGY;

EID: 0032686879     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/16.760414     Document Type: Article
Times cited : (101)

References (12)
  • 10
    • 0004020231 scopus 로고    scopus 로고
    • 2nd ed. Oxford U.K.: Oxford Univ. Press 1975 ch. 3 pp. 38-39.
    • J. Crank The Mathematics of Diffusion 2nd ed. Oxford U.K.: Oxford Univ. Press 1975 ch. 3 pp. 38-39.
    • The Mathematics of Diffusion
    • Crank, J.1
  • 11
    • 33749814522 scopus 로고    scopus 로고
    • 1 Technol. Model. Assoc. Inc. Palo Alto CA 1992.
    • MEDICI User's Manual ver. 1 Technol. Model. Assoc. Inc. Palo Alto CA 1992.
    • Manual Ver.
    • User'S, M.1
  • 12
    • 33749814522 scopus 로고    scopus 로고
    • 5 Technol. Model. Assoc. Inc. Palo Alto CA 1992.
    • TSUPREM-4 User's Manual ver. 5 Technol. Model. Assoc. Inc. Palo Alto CA 1992.
    • Manual Ver.
    • User, T.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.