Characterization and strain gradient optimization of PECVD poly-SiGe layers for MEMS applications

Sensors and Actuators, A: Physical

Volumn 130-131, Issue SPEC. ISS., 2006, Pages 403-410

  Gromova, M ^a,b   Mehta, A ^a   Baert, K ^a   Witvrouw, A ^a  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

Hydrogen dilution; Microcrystalline; Multi layer; PECVD; Poly SiGe; Strain gradient

Indexed keywords

CRYSTALLIZATION; ELECTRIC PROPERTIES; MECHANICAL PROPERTIES; MICROELECTROMECHANICAL DEVICES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYSILANES;

HYDROGEN DILUTION; MICROCRYSTALLINE; POLY-SIGE; STRAIN GRADIENT;

MULTILAYERS;

EID: 33745872532     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sna.2005.12.048     Document Type: Article

References (15)

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