Low-temperature LPCVD MEMS technologies

Materials Research Society Symposium - Proceedings

Volumn 729, Issue , 2002, Pages 205-213

  Howe, Roger T ^a   King, Tsu Jae ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; CMOS INTEGRATED CIRCUITS; LOW TEMPERATURE EFFECTS; MECHANICAL PROPERTIES; MICROELECTROMECHANICAL DEVICES; PRESSURE EFFECTS;

LOW PRESSURE CHEMICAL VAPOR DEPOSITION; MICROMECHANICAL STRUCTURES; POST-DEPOSITION ANNEALING;

POLYSILICON;

EID: 0036924806     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-729-u5.1     Document Type: Conference Paper

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