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Volumn 27, Issue 7, 2006, Pages 605-608

MOSFET hot-carrier reliability improvement by forward-body bias

Author keywords

Forward body bias; Hot carrier reliability; MOSFET; Reverse body bias; Substrate bias

Indexed keywords

CMOS INTEGRATED CIRCUITS; HOT CARRIERS; RELIABILITY; STANDBY POWER SYSTEMS; THRESHOLD VOLTAGE; VOLTAGE CONTROL;

EID: 33745646570     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2006.877306     Document Type: Article
Times cited : (35)

References (11)
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    • Apr
    • H. Koura, M. Takamiya, and T. Hiramoto, "Optimum conditions of body effect factor and substrate bias in various threshold voltage MOSFETs," Jpn. J. Appl. Phys., vol. 39, no. 4B, pp. 2312-2317, Apr. 2000.
    • (2000) Jpn. J. Appl. Phys. , vol.39 , Issue.4 B , pp. 2312-2317
    • Koura, H.1    Takamiya, M.2    Hiramoto, T.3
  • 3
    • 21644486110 scopus 로고    scopus 로고
    • "Circuit techniques for subthreshold leakage avoidance, control, and tolerance"
    • S. Borkar, "Circuit techniques for subthreshold leakage avoidance, control, and tolerance," in IEDM Tech. Dig., 2004, pp. 421-424.
    • (2004) IEDM Tech. Dig. , pp. 421-424
    • Borkar, S.1
  • 4
    • 0034315571 scopus 로고    scopus 로고
    • "Injection efficiency of CHISEL gate currents in short MOS devices: Physical mechanism, device implications, and sensitivity to technological parameters"
    • Nov
    • D. Esseni, L. Selmi, A. Ghetti, and E. Sangiorgi, "Injection efficiency of CHISEL gate currents in short MOS devices: Physical mechanism, device implications, and sensitivity to technological parameters," IEEE Trans. Electron Devices, vol. 47, no. 11, pp. 2194-2200, Nov. 2000.
    • (2000) IEEE Trans. Electron Devices , vol.47 , Issue.11 , pp. 2194-2200
    • Esseni, D.1    Selmi, L.2    Ghetti, A.3    Sangiorgi, E.4
  • 6
    • 0020252646 scopus 로고
    • "Hot-electron induced excess carriers in MOSFET's"
    • Dec
    • S. Tam, F.-C. Hsu, P.-K. Ko, C. Hu, and R.-S. Muller, "Hot-electron induced excess carriers in MOSFET's," IEEE Electron Device Lett., vol. EDL-3, no. 12, pp. 376-378, Dec. 1982.
    • (1982) IEEE Electron Device Lett. , vol.EDL-3 , Issue.12 , pp. 376-378
    • Tam, S.1    Hsu, F.-C.2    Ko, P.-K.3    Hu, C.4    Muller, R.-S.5
  • 7
    • 84945713471 scopus 로고
    • "Hot-electron-induced MOSFET degradation - Model, monitor, and improvement"
    • Feb
    • C. Hu, S. C. Tam, F.-C. Hsu, P.-K. Ko, T.-Y. Chan, and K. W. Terrill, "Hot-electron-induced MOSFET degradation - Model, monitor, and improvement," IEEE Trans. Electron Devices, vol. ED-32, no. 2, pp. 375-385, Feb. 1985.
    • (1985) IEEE Trans. Electron Devices , vol.ED-32 , Issue.2 , pp. 375-385
    • Hu, C.1    Tam, S.C.2    Hsu, F.-C.3    Ko, P.-K.4    Chan, T.-Y.5    Terrill, K.W.6
  • 10
    • 0022135706 scopus 로고
    • "Dependence of channel electric field on device scaling"
    • Oct
    • T. Y. Chan, P.-K. Ko, and C. Hu, "Dependence of channel electric field on device scaling," IEEE Electron Device Lett., vol. EDL-6, no. 10, pp. 551-553, Oct. 1985.
    • (1985) IEEE Electron Device Lett. , vol.EDL-6 , Issue.10 , pp. 551-553
    • Chan, T.Y.1    Ko, P.-K.2    Hu, C.3
  • 11
    • 0021520612 scopus 로고
    • "An analytical model for the channel electric field in MOSFET's with graded-drain structures"
    • Nov
    • K.-W. Terrill, C. Hu, and P.-K. Ko, "An analytical model for the channel electric field in MOSFET's with graded-drain structures," IEEE Electron Device Lett., vol. EDL-5, no. 11, pp. 440-442, Nov. 1984.
    • (1984) IEEE Electron Device Lett. , vol.EDL-5 , Issue.11 , pp. 440-442
    • Terrill, K.-W.1    Hu, C.2    Ko, P.-K.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.