Nanolithography in thermally sacrificial polymers using nanoscale thermal probes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6153 I, Issue , 2006, Pages

  Hua, Yueming ^a   Saxena, Shubham ^b   King, William P ^b   Henderson, Clifford L ^a  

^a Georgia Institute of Technology   (United States)

^b GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

AFM; Cantilever; Heated; Nanolithography; Polycarbonate; Sacrificial polymer

Indexed keywords

HEATED; PATTERNED IMAGES; PHYSIOCHEMICAL PROPERTIES; SACRIFICIAL POLYMERS;

ATOMIC FORCE MICROSCOPY; CANTILEVER BEAMS; GLASS TRANSITION; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; POLYCARBONATES; SURFACE TOPOGRAPHY; TEMPERATURE DISTRIBUTION;

POLYMERS;

EID: 33745602529     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.661803     Document Type: Conference Paper

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