Optimization of geometry of alignment mark using rigorous coupled-wave analysis (RCWA)

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5752, Issue I, 2005, Pages 471-479

  Chalykh, Roman ^a   Kim, Seong Sue ^a   Woo, Sang Gyun ^a   Cho, Han Ku ^a   Moon, Joo Tae ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

Alignment optimization; Overlay simulation; Rigorous coupled wave analysis

Indexed keywords

COMPUTER SIMULATION; DIFFRACTION; ELECTROMAGNETIC WAVES; GEOMETRICAL OPTICS; OPTIMIZATION; PROCESS CONTROL;

ALIGNMENT OPTIMIZATION; MEMORY SIZE; OVERLAY SIMULATION; RIGOROUS COUPLED-WAVE ANALYSIS;

ALIGNMENT;

EID: 24644518923     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.601142     Document Type: Conference Paper

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