Line edge roughness on photo lithographic masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6152 I, Issue , 2006, Pages

  Heins, Torben ^a   Dersch, Uwe ^a   Liebe, Roman ^a   Richter, Jan ^a  

^a Advanced Mask Technology Center GmbH and Co KG   (Germany)

Author keywords

Line edge roughness; Line width roughness; Measurement algorithms; Photo lithographic masks; Scanning electron microscopy

Indexed keywords

ALGORITHMS; OPTIMIZATION; PHOTOLITHOGRAPHY; RELIABILITY; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS;

LINE-EDGE ROUGHNESS; LINE-WIDTH ROUGHNESS; MEASUREMENT ALGORITHMS; PHOTO LITHOGRAPHIC MASKS;

MASKS;

EID: 33745585771     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.655531     Document Type: Conference Paper

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