193 nm resists for deep sub-wavelength applications

Journal of Photopolymer Science and Technology

Volumn 12, Issue 3, 1999, Pages 433-444

  Dammel, R ^a,b   Cook, M ^a   Klauck Jacobs, A ^a   Kudo, T ^a   Mehtsun, S ^a   Oberlander, J ^a   Padmanaban, M ^a   Rahman, D L ^a  

^a CLARIANT CORPORATION   (United States)

^b SÜD CHEMIE AG   (Germany)

Author keywords

193 nm resists; 2 methyl 2 adamantane methacrylate; Methacrylate copolymers; Mevalonic lactone methacrylate; Novolak resist; Polysilicon

Indexed keywords

EID: 33745564315     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.12.433     Document Type: Article

References (14)

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14. All Prolith/2 calculations were carried out using a medium speed setting. Since some of the NAs studied were quite high, all calculations used the full vector model.