Unintentional doping and compensation effects of carbon in metal-organic chemical-vapor deposition fabricated ZnO thin films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 24, Issue 4, 2006, Pages 1213-1217

  Li, Xiaonan ^a   Asher, Sally E ^a   Limpijumnong, Sukit ^a,b   Zhang, S B ^a   Wei, Su Huai ^a   Barnes, Teresa M ^a   Coutts, Timothy J ^a   Noufi, Rommel ^a  

^a NATIONAL RENEWABLE ENERGY LABORATORY   (United States)

^b SURANAREE UNIVERSITY OF TECHNOLOGY   (Thailand)

Author keywords

[No Author keywords available]

Indexed keywords

COMPENSATION EFFECTS; FORMATION ENERGY; METAL-ORGANIC CHEMICAL-VAPOR DEPOSITION (MOCVD); PASSIVATION FACTORS;

CARBON; CHEMICAL VAPOR DEPOSITION; DOPING (ADDITIVES); METALLIC FILMS; THIN FILMS; ZINC OXIDE;

ORGANOMETALLICS;

EID: 33745513674     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2167981     Document Type: Article

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