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Volumn 153, Issue 8, 2006, Pages

Hydrogen reintroduction by forming gas annealing to LPCVD silicon nitride coated structures

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; COATINGS; ELECTROCHEMISTRY; HYDROGEN BONDS; OPTICAL PROPERTIES; PASSIVATION; SILICON WAFERS; THERMAL EFFECTS;

EID: 33745488385     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2207058     Document Type: Article
Times cited : (12)

References (28)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.