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Volumn 352, Issue 9-20 SPEC. ISS., 2006, Pages 964-967

Large grain μc-Si:H films deposited at low temperature: Growth process and electronic properties

Author keywords

Chemical vapor deposition; Conductivity; Ellipsometry; Microcrystallinity; Nanoparticles; Raman spectroscopy; Solar cells; Thin film transistors

Indexed keywords

ARGON; CHEMICAL VAPOR DEPOSITION; DEPOSITION; ELLIPSOMETRY; FILM GROWTH; PHYSICAL PROPERTIES; RAMAN SPECTROSCOPY; SILICON; SOLAR CELLS; THERMAL EFFECTS; THIN FILM TRANSISTORS; THIN FILMS;

EID: 33745458944     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2005.10.060     Document Type: Article
Times cited : (23)

References (17)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.