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Volumn 289, Issue 1-3, 2001, Pages 168-174

Effect of oxygen contamination on the properties of the silicon hydrogen alloy materials deposited under conditions near the microcrystalline silicon formation region

(2) Dutta Gupta, Namita a Chaudhuri, Partha a

a Energy Research Unit (India)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CHEMICAL BONDS; CONTAMINATION; CRYSTAL GROWTH; GRAIN GROWTH; OXYGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILANES; ULTRAHIGH VACUUM;

MONOCRYSTALLINE SILICON FILMS;

SILICON ALLOYS;

EID: 0035421595 PISSN: 00223093 EISSN: None Source Type: Journal
DOI: 10.1016/S0022-3093(01)00723-2 Document Type: Article

Times cited : (10)

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