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Volumn 15, Issue 4-8, 2006, Pages 898-903

Roughness evolution during growth of hydrogenated tetrahedral amorphous carbon

Author keywords

Plasma CVD; Surface characterization; Surface structure; Tetrahedral amorphous carbon

Indexed keywords

AMORPHOUS MATERIALS; CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; DATA STORAGE EQUIPMENT; DEPOSITION; SURFACE ROUGHNESS; THICKNESS CONTROL;

EID: 33745228879     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2005.10.052     Document Type: Article
Times cited : (31)

References (35)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.