Macroparticle filtering of high-current vacuum arc plasmas

IEEE Transactions on Plasma Science

Volumn 25, Issue 4, 1997, Pages 660-664

  Schülke, Thomas ^a   Anders, André ^a   Siemroth, Peter ^a  

^a FRAUNHOFER INSTITUTE FOR MATERIAL AND BEAM TECHNOLOGY IWS   (Germany)

Author keywords

Carbon films; Deposition; Filtering; Hard coatings; High current; Microparticle; Plasma; Vacuum arc

Indexed keywords

CARBON; CATHODES; ELECTRIC ARCS; MAGNETIC FIELDS; MAGNETIC FILTERS; VACUUM;

HIGH CURRENT VACUUM ARC PLASMAS; MACROPARTICLE FILTERING;

PLASMAS;

EID: 0031211898     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.640681     Document Type: Article

References (12)

1. P. Siemroth, T. Schülke, and T. Witke, "High-current arc - A new source for high-rate deposition," Surface Coatings Technol., vols. 68/69, pp. 314-319, 1994.
2. S. Anders, A. Anders, K. M. Yu , X. Y. Yao, and I. G. Brown, "On the macroparticle flux from vacuum arc cathode spots," IEEE Trans. Plasma Sci., vol. 21, pp. 440-446, 1993.
3. M. Ives, J. Brooks, J. Cawley, and W. Burgmer, "Fundamental studies of the steered arc technique," Surface Coatings Technol., vol. 49, pp. 244-252, 1991.
4. S. Anders, A. Anders, and I. G. Brown, "Macroparticle-free thin films produced by an efficient vacuum arc deposition technique," J. Appl. Phys., vol. 7, no. 6, pp. 4239-4241, 1993.
5. _, "Effect of duct bias on transport of vacuum arc plasmas through curved magnetic filters," J. Appl. Phys., vol. 75, no. 10, pp. 4900-4905, 1994.
6. A. Anders, S. Anders, and I. G. Brown, "Focused injection of vacuum arc plasmas into curved magnetic filters," J. Appl. Phys., vol. 75, no. 10, pp. 4895-4899, 1994.
7. J. C. Sherman, R. Webster, J. E. Jenkins, and R. Holmes, "Cathode spot motion in high-current vacuum arcs on copper electrodes," J. Phys. D: Appl. Phys., vol. 8, pp. 696-702, 1975.
8. M. M. M. Bilek, M. Chhowalla, M. Weiler, and W. I. Milne, "Ion energy and plasma characterization in a silicon filtered cathodic vacuum arc," J. Appl. Phys., vol. 79, no. 3, pp. 1287-1291, 1996.
9. C. W. Kimblin, "Vacuum arc ion currents and electrode phenomena," Proc. IEEE, vol. 59, no. 4, pp. 546-555, 1971.
10. R. L. Boxman, S. Goldsmith, A. Ben-Shalom, L. Kaplan, D. Arbilly, E. Gidalevich, V. Zhitomirsky, A. Ishaya, M. Keidar, and I. I. Beilis, "Filtered vacuum arc deposition of semiconductor thin films," IEEE Trans. Plasma Sci., vol. 23, pp. 939-944, 1995.
11. D. Schneider, H.-J. Scheibe, and P. Hess, "Characterization of thin diamond-like carbon films by ultrasonic surface waves," Diamond Related Materials, vol. 2, no. 11, pp. 1396-1401, 1993.
12. T. Schülke, "Magnetische Plasmafilterung am Hochstrombogen," DAAD Final Rep., 1995.