Determination of the absolute fluence profile in pulsed laser processing using melt-induced phase changes in an amorphous silicon thin film

Review of Scientific Instruments

Volumn 77, Issue 5, 2006, Pages

  Leonard, J P ^a  

^a University of Pittsburgh   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FLOOD IRRADIATION; FLUENCES; PULSED LASER PROCESSING;

AMORPHOUS SILICON; EXCIMER LASERS; MULTILAYERS; POLYCRYSTALLINE MATERIALS; PULSED LASER APPLICATIONS;

THIN FILMS;

EID: 33744901136     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2198727     Document Type: Article

References (38)

1. Lasers in Surface Engineering, ASM International Surface Engineering Series 1, edited by, N. B. Dahotre, (American Society for Metals, Metals Park, OH, 1998).
2. C. P. Grigoropoulos, S. J. Moon, and M. H. Lee, Semicond. Semimetals 75, 11 (2003).
3. S. M. Metev and V. P. Veiko, Laser-Assisted Microtechnology (Springer, New York, 1998).
4. J. F. Ready, Industrial Applications of Lasers (Academic, New York, 1997).
5. R. Gonzalez-Moreno, J. A. Quiroga, J. Alonso, and E. Bernabeu, Opt. Eng. (Bellingham) 44, 023602 (2005).
6. R. M. Wood, Laser-Induced Damage of Optical Materials (IOP, Bristol, 2003).
7. J. Y. Zhang, H. Esrom, and I. W. Boyd, Appl. Surf. Sci. 138-139, 315 (1999).
8. P. E. Dyer, D. M. Karnakis, P. H. Key, and P. Monk, Appl. Surf. Sci. 96-98, 415 (1996).
9. M. O. Thompson, G. J. Galvin, J. W. Mayer, P. S. Peercy, and R. B. Hammond, Appl. Phys. Lett. 42, 445 (1983).
10. D. H. Auston, C. M. Surko, T. N. C. Venkatesan, R. E. Slusher, and J. A. Golovchenko, Appl. Phys. Lett. 33, 437 (1978).
11. J. P. Leonard, Ph.D. thesis, 2000.
12. J. P. Leonard and J. S. Im, Appl. Phys. Lett. 78, 3454 (2001).
13. E. Fogarassy, S. de Unamuno, B. Prevot, T. Harrer, and S. Maresch, Thin Solid Films 383, 48 (2001).
14. R. F. Wood, G. A. Geist, and C. L. Liu, Phys. Rev. B 53, 15863 (1996).
15. S. J. Moon, M. Lee, and C. P. Grigoropoulos, J. Heat Transfer 124, 253 (2002).
16. R. Cerny and P. Prikryl, Semicond. Semimetals 75, 42 (2003).
17. D. E. Hoglund, M. O. Thompson, and M. J. Aziz, Phys. Rev. B 58, 189 (1998).
18. X. Xu, C. P. Grigoropoulos, and R. E. Russo, Appl. Phys. Lett. 65, 1745 (1994).
19. S. Palmer and S. Matteson, J. Vac. Sci. Technol. A 6, 1900 (1988).
20. H. A. Macleod, Thin-Film Optical Filters, 3rd ed. (IOP, Bristol, 2001).
21. V. V. Gupta, H. J. Song, and J. S. Im, Appl. Phys. Lett. 71, 99 (1997).
22. G. J. Galvin and J. W. Mayer, Appl. Phys. Lett. 46, 644 (1985).
23. G. E. Jellison and F. A. Modine, J. Appl. Phys. 76, 3758 (1994).
24. M. S. K. Fuchs, J. Phys.: Condens. Matter 12, 4341 (2000).
25. Properties of Silicon, EMIS data reviews series No. 4 (INSPEC, Institute of Electrical Engineers, London, 1988).
26. S. Kimura and K. Terashima, J. Cryst. Growth 180, 323 (1997).
27. W. K. Rhim, S. K. Chung, A. J. Rulison, and R. E. Spjut, Int. J. Thermophys. 18, 459 (1997).
28. P. H. Bucksbaum and M. O. Thompson, Mater. Res. Soc. Symp. Proc. 74, 123 (1987).
29. J. Y. Tsao, M. J. Aziz, M. O. Thompson, and P. S. Peercy, Phys. Rev. Lett. 56, 2712 (1986).
30. G. B. Shinn, F. Steigerwald, H. Stiegler, R. Sauerbrey, F. K. Tittel, and W. L. Wilson, J. Vac. Sci. Technol. A 4, 1273 (1986).
31. J. S. Im, M. A. Crowder, R. S. Sposili, J. P. Leonard, H. J. Kim, J. H. Yoon, V. V. Gupta, H. J. Song, and H. S. Cho, Phys. Status Solidi A 166, 603 (1998).
32. M. O. Thompson, G. J. Galvin, J. W. Mayer, P. S. Peercy, J. M. Poate, D. C. Jacobson, A. G. Cullis, and N. G. Chew, Phys. Rev. Lett. 52, 2360 (1984).
33. T. Sameshima and S. Usui, J. Appl. Phys. 74, 6592 (1993).
34. J. Siegel, J. Solis, and C. N. Afonso, J. Appl. Phys. 84, 5531 (1998).
35. C. Hill and D. J. Godfrey, J. Phys. Colloq. 41, 79 (1980).
36. W. C. Sinke, A. Polman, S. Roorda, and P. A. Stolk, Appl. Surf. Sci. 43, 128 (1989).
37. K. K. Desfulian, J. P. Krusius, M. O. Thompson, and S. Talwar, Appl. Phys. Lett. 81, 2238 (2002).
38. J. Y. Degorce, A. Saucier, and M. Meunier, Appl. Surf. Sci. 208-209, 267 (2003).