Slow interfacial reamorphization of Ge films melted by ps laser pulses

Journal of Applied Physics

Volumn 84, Issue 10, 1998, Pages 5531-5537

  Siegel, J ^a   Solis, J ^a   Afonso, C N ^a  

^a INSTITUTO DE ÓPTICA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001197226     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.368598     Document Type: Article

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