Removing focused ion-beam damages on transmission electron microscopy specimens by using a plasma cleaner

Journal of Electron Microscopy

Volumn 55, Issue 1, 2006, Pages 23-26

  Hata, Satoshi ^a   Sosiati, Harini ^a   Kuwano, Noriyuki ^a   Itakura, Masaru ^a   Nakano, Takayoshi ^b   Umakoshi, Yukichi ^b  

^a KYUSHU UNIVERSITY   (Japan)

^b OSAKA UNIVERSITY   (Japan)

Author keywords

Focused ion beam; Plasma cleaner; Surface damage; Transmission electron microscopy

Indexed keywords

FOCUSED ION BEAMS; IMAGE ENHANCEMENT; IONS; PLASMA APPLICATIONS;

BEAM DAMAGE; FOCUSED ION BEAM MILLING; FOCUSED IONS BEAMS; HIGH-RESOLUTION IMAGES; MICROSCOPY IMAGING; PLASMA CLEANERS; PLASMA TREATMENT; SURFACE DAMAGES; THINNINGS; TREATMENT CONDITIONS;

HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY;

EID: 33646779889     PISSN: 00220744     EISSN: 14779986     Source Type: Journal    
DOI: 10.1093/jmicro/dfl001     Document Type: Article

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