Experiences in cross section preparation of layered materials by FIB-method;Erfahrungen bei der Querschnittspräparation von Schichtwerkstoffen mittels FIB-Methode

Praktische Metallographie/Practical Metallography

Volumn 40, Issue 3, 2003, Pages 109-129

  Arnold, Birgit ^a   Bauer, Hans Dietrich ^a  

^a IFW DRESDEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHIZATION; ELECTRON TRANSPORT PROPERTIES; ION BEAMS; ION BOMBARDMENT; PLASMA APPLICATIONS; THICKNESS MEASUREMENT; TRANSMISSION ELECTRON MICROSCOPY; CUTTING TOOLS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; PLATINUM COMPOUNDS;

ELECTRON TRANSPARENT AREAS; FOCUSED ION BEAM; LAYERED MATERIALS; METALLIC BARRIER LAYERS; PLASMA CLEANER; THINNING PROCESS;

GALLIUM; ION BOMBARDMENT;

BARRIER LAYERS; LAYERED MATERIAL; LAYERED SYSTEMS; PLASMA CLEANERS; PREPARATION TECHNIQUE; SAMPLE SURFACE; SELECTED EXAMPLES; THINNING PROCESS;

EID: 0037345857     PISSN: 0032678X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (7)

1. Spolenak, R.; Heiland, B.; Witt, C.; Keller, R.-M.; Müller, P.; Arzt, E.: Prakt. Metallogr. 37 (2000) 2, 90-101
2. Mc Caffrey, J. P.; Phaneuff, M. W.; Madsen, L. D.: Ultramicroscopy 87 (2001) 97-104
3. Barna, Á.; Pécz, B.; Menyhard, M.: Ultramicroscopy 70 (1998), 161-171
4. Ziegler, J.F.; Biersack, J.P.; Littmark, U.: The stopping and range of ions in solids, Pergamon Press, New York, United States of America, 1985
5. Hillman, L.: persönliche Mitteilung, 2002
6. Bauer, H.-D.; Arnold, B.; Binder, K.: Proceedings of ICEM 02, Durban, S. A. (2002), 269-270
7. South Bay Technology Inc.: Plasma Trimming for TEM Semiconductor Devices, firm printed matter, 2001