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Applied Physics A: Materials Science and Processing

Volumn 79, Issue 4-6, 2004, Pages 961-963

Low-fluence femtosecond-laser interaction with a Mo/Si multilayer stack

(3) Hoche T a,b Ruthe, D b Petsch, T a

a 3D Micromac AG (Germany)

b LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; AMORPHIZATION; KINETIC ENERGY; MICROMACHINING; MOLYBDENUM; MULTILAYERS; SILICON; SILICON WAFERS; SPUTTER DEPOSITION; SUPERLATTICES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

FEMTOSECOND LASER MACHINING; LASER-FLUENCES; NANOMETERS; WAVELENGTHS;

LASER BEAM EFFECTS;

EID: 4344682546 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s00339-004-2583-4 Document Type: Conference Paper

Times cited : (15)

References (7)

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