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Volumn 88, Issue 18, 2006, Pages

Direct epitaxial growth of semiconducting β-FeSi2 thin films on Si(111) by facing targets direct-current sputtering

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; EPITAXIAL GROWTH; IRON COMPOUNDS; SINGLE CRYSTALS; SPUTTERING; SURFACE ROUGHNESS;

EID: 33646518848     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2200153     Document Type: Article
Times cited : (53)

References (14)
  • 9
    • 0014615843 scopus 로고
    • edited by R. R.Haberecht and E. L.Kern (Electrochemical Society, New York
    • D. L. Kendall and D. B. Devries, in Semiconductor Silicon, edited by, R. R. Haberecht, and, E. L. Kern, (Electrochemical Society, New York, 1969), p. 358.
    • (1969) Semiconductor Silicon , pp. 358
    • Kendall, D.L.1    Devries, D.B.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.