Reduction of iron diffusion in silicon during the epitaxial growth of β-FeSi2 films by use of thin template buffer layers

Journal of Applied Physics

Volumn 95, Issue 8, 2004, Pages 4019-4024

  Liu, Zhengxin ^a   Suzuki, Yasuhito ^a   Osamura, Masato ^a   Ootsuka, Teruhisa ^a   Mise, Takahiro ^a   Kuroda, Ryo ^b,c   Tanoue, Hisao ^b   Makita, Yunosuke ^b   Wang, Shinan ^b   Fukuzawa, Yasuhiro ^b   Otogawa, Naotaka ^b   Nakayama, Yasuhiko ^b  

^a System Engineers' Co Ltd   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^c NIPPON INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DEFECTS; DIFFUSION; EPITAXIAL GROWTH; GRAIN BOUNDARIES; HIGH TEMPERATURE EFFECTS; IRON COMPOUNDS; KINETIC ENERGY; LEAKAGE CURRENTS; LIGHT EMITTING DIODES; MULTILAYERS; RAMAN SCATTERING; REDUCTION; SCANNING ELECTRON MICROSCOPY; SPUTTERING; TRANSMISSION ELECTRON MICROSCOPY;

BUFFER LAYERS; FACING TARGET SPUTTERING (FTS); HIGH-RESOLUTION IMAGES; PHOTOSENSORS; TRANSVERSE OPTICAL (TO) PHONONS;

SEMICONDUCTING FILMS;

EID: 2342592128     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1682683     Document Type: Article

References (15)

1. M. C. Bost and J. E. Mahan, J. Appl. Phys. 58, 2696 (1985).
2. K. Yamaguchi and K. Mizushima, Phys. Rev. Lett. 86, 6006 (2001).
3. K. Lekfi and P. Muret, J. Appl. Phys. 74, 1138 (1993).
4. S. N. Wang, N. Otogawa, Y. Fukuzawa, H. L. Shen, H. Tanoue, T. Kojima, Y. Nakayama, and Y. Makita, Proc. SPIE 5065, 188 (2003).
5. I. Nishida, Phys. Rev. B 7, 2710 (1973).
6. Z. X. Liu et al., Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion (WEPEC-3), 11-18 May, 2003, Oosaka, Japan, 1P-C3-15.
7. X. Wallart, J. P. Nys, O. Dehaese, and G. Vincent, Appl. Surf. Sci. 70/71, 598 (1993).
8. K. Wünstel and P. Wagner, Appl. Phys. A: Solids Surf. 27, 207 (1982).
9. T. Isobe, H. Nakashima, and K. Hashimoto, Jpn. J. Appl. Phys., Part 1 28, 1283 (1989).
10. S. Kadokura and K. Honjyo, Proceeding of Symposium V: Materials for Information Storage Media of the 3rd IUMRS International Conference on Advanced Materials, Tokyo, Japan, 1993, pp. 737-742.
11. S. Kadokura, J. Vac. Soc. Jpn. 44, 808 (2001).
12. R. Kuroda et al., Thin Solid Films (to be published).
13. J. Alvarez, J. J. Harinejos, E. G. Michel, and R. Miranda, Surf. Sci. 287/288, 490 (1993).
14. E. R. Weber, Appl. Phys. A: Solids Surf. 30, 1 (1983).
15. E. Weber and H. G. Riotte, J. Appl. Phys. 51, 1484 (1980).