Creating Nanoscale Patterns of Dendrimers on Silicon Surfaces with Dip-Pen Nanolithography

Nano Letters

Volumn 2, Issue 7, 2002, Pages 713-716

  McKendry, Rachel ^a   Huck, Wilhelm T S ^a   Weeks, Brandon ^a   Fiorini, Maria ^a   Abell, Chris ^a   Rayment, Trevor ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0041684552     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl020247p     Document Type: Article

References (18)

1. Piner, R. D.; Zhu, J.; Xu, F.; Hong, S. H.; Mirkin, C. A. Science 1999, 283, 661-663.
2. Hong, S. H.; Zhu, J.; Mirkin, C. A. Science 1999, 286, 523-525.
3. Hang, S. H.; Mirkin, C. A. Science 2000, 288, 1808-1811.
4. Wilson, D. L.; Martin, R.; Hong, S.; Cronin-Golomb, M.; Mirkin, C. A.; Kaplan, D. L. Proc. Natl. Acad. Sci. U.S.A. 2001, 98, 13660-13664.
5. Ivanisevic, A.; Mirkin, C. A. J. Am. Chem. Soc. 2001, 123, 7887-7889.
6. Noy, A.; Miller, A. E.; Klare, J. E.; Weeks, B. L.; Woods, B. W.; BeYoreo, J. J. Nano Lett. 2002, 2, 109-112.
7. Maynor, B. W.; Filocamo, S. F.; Grinstaff, M. W.; Liu, J. J. Am. Chem. Soc. 2002, 124, 522-523.
8. Tomalia, D. A. Adv. Mater. 1994, 6, 529-539.
9. Bhyrappa, P.; Young, J. K.; Moore, J. S.; Suslick, K. S. J. Am. Chem. Soc. 1996, 118, 5708-5711.
10. Jansen, J. F. G. A.; De Brabander-van den Berg, E. M. M.; Meijer, E. W. Science 1994, 226, 1266-1299.
11. Sadamoto, R.; Tomioka, N.; Aida, T. J. Am. Chem. Soc. 1996, 118, 3978-3979.
12. Weener, J. W.; Meijer, E. W. Adv. Mater. 2000, 12, 741.
13. Duijvenbode, Rietveld, I. B. Langmuir 2000, 16, 7720-7725.
14. Esumi, K.; Goino, M. Langmuir 1998, 14, 4466-4470.
15. Li, H.; Kang, D.-J.; Blamire, M.; Huck, W. T. S. Nano Lett. 2002, 2, 347.
16. Loaded silicon nitride tips (Thermomicroscopes, triangular, spring constant 0.06 N/m) were prepared by immersion in a 10 μM ethanolic solution of dendrimer (Aldrich, U.K.) for 5 s and then left to air-dry for 5 min prior to use. Si(100) wafers were used as supplied from Compart Technology, U.K.
17. Experiments were conducted using an Eastcoast Scientific AFM, with a quadrant photodetector allowing simultaneous topographic and friction force measurements. Contact mode AFM was performed in air at 19.5 ± 0.5 °C and relative humidity of 52 ± 2%.
18. Zhang, X.; Wilhelm, M.; Klein, J.; Pfaadt, M.; Meijer, E. W. Langmuir 2000, 16, 3884-3892.