Influence of the deposition parameters on the texture of boron nitride thin films synthesized in a microwave plasma-enhanced reactor

Surface and Coatings Technology

Volumn 200, Issue 22-23 SPEC. ISS., 2006, Pages 6444-6448

  Thevenin P ^a   Eliaoui, M ^a,b   Ahaitouf, A ^b   Soltani, A ^c   Bath, A ^a  

^a SUPELEC   (France)

^b SIDI MOHAMED BEN ABDELLAH UNIVERSITY   (Morocco)

^c INSTITUT D ELECTRONIQUE   (France)

Author keywords

Anisotropy; Boron nitride; PECVD; Texturation

Indexed keywords

ABSORPTION; ANISOTROPY; BORON COMPOUNDS; NANOSTRUCTURED MATERIALS; RADIOFREQUENCY SPECTROSCOPY; SPUTTERING; TEXTURES; THIN FILMS;

ANISOTROPIC UNIAXIAL MEDIUM; BORANE DIMETHYL AMINE; BORON NITRIDE THIN FILMS; INFRARED TRANSMITTANCE SPECTROSCOPY; MICROWAVE PLASMA-ENHANCED REACTOR; OPTICAL VIBRATION; RADIOFREQUENCY SIGNAL;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

ABSORPTION; ANISOTROPY; BORON COMPOUNDS; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RADIOFREQUENCY SPECTROSCOPY; SPUTTERING; TEXTURES; THIN FILMS;

EID: 33646130156     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.11.096     Document Type: Article

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