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Volumn 100-101, Issue 1-3, 1998, Pages 388-392

Properties of cubic boron nitride thin films deposited by a hybrid RF-PLD-technique

Author keywords

Compressive stress; Cubic boron nitride; Pulsed layer deposition; RF bias

Indexed keywords

ARGON; COMPOSITION EFFECTS; CRACK INITIATION; DELAMINATION; DEPOSITION; FILM GROWTH; ION BOMBARDMENT; NANOSTRUCTURED MATERIALS; PULSED LASER APPLICATIONS; STOICHIOMETRY; STRESSES; THIN FILMS;

EID: 0032021746     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00654-3     Document Type: Article
Times cited : (4)

References (26)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.