Growth of oriented BN films prepared by electron cyclotron resonance CVD

Journal of Crystal Growth

Volumn 223, Issue 4, 2001, Pages 545-549

  Zhang, Shengjun ^a   Chen, Guanghua ^a   Wang, Bo ^a   Zhang, Dexue ^a   Yan, Hui ^a  

^a BEIJING UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; BORON COMPOUNDS; CHEMICAL VAPOR DEPOSITION; ELECTRON CYCLOTRON RESONANCE; FILM GROWTH; FILM PREPARATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LIGHT ABSORPTION; MORPHOLOGY; NITRIDES; PIEZOELECTRIC MATERIALS; X RAY DIFFRACTION ANALYSIS;

BORON NITRIDES;

DIELECTRIC FILMS;

EID: 0035277312     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(01)00679-0     Document Type: Article

References (30)

1. Mirkarimi P.B., McCarty K.F., Medlin D.L. Mater. Sci. Eng. R12:1997;47.
2. Yokota Y., Tagawa S., Sugino T. J. Vac. Sci. Technol. B17:1999;642.
3. Loh K.P., Sakaguchi I., Gamo M.N., Tagawa S., Sugino T., Ando T. Appl. Phys. Lett. 74:1999;28.
4. Sugino T., Tanioka K., Kawasaki S., Shirafuji J. Diam. Relat. Mater. 7:1998;632.
5. Boudiombo J., Loulergue J.C., Bath A., Thevenin P. Mater. Sci. Eng. B59:1999;244.
6. Ishii T., Sato T. J. Crystal Growth. 61:1983;689.
7. Yano M., Okamoto M., Yap Y.K., Yoshimura M., Mori Y., Sasaki T. Diam. Relat. Mater. 9:2000;512.
8. Phani A.R. J. Mater. Res. 14:1999;829.
9. Gómez-Alexandre C., Díaz D., Orgaz F., Albella J.M. J. Phys. Chem. 97:1993;11043.
10. Saitoh H., Yarbrough W.A. Appl. Phys. Lett. 58:1991;2228.
11. Rickerby D.G., Gibson P.N., Gissler W., Haupt J. Thin Solid Films. 209:1992;155.
12. Andújar J.L., Bertran E., Polo M.C. J. Vac. Sci. Technol. A16:1998;578.
13. Kalss W., Haubner R., Lux B. Diam. Relat. Mater. 7:1998;369.
14. Polo M.C., Ben el Mekki M., Andújar J.L., Mestres N., Pascual J. Diam. Relat. Mater. 6:1997;1550.
15. Abdellaoui A. Mater. Sci. Eng. B47:1997;257.
16. Wakatsuchi M., Takaba Y., Kanai K., Ueda Y., Nishikawa M. Jpn. J. Appl. Phys. 38:1999;4515.
17. Widmayer P., Schwertberger D., Wenig M.J., Ziemann P., Bergmaier A., Dollinger G. Diam. Relat. Mater. 7:1998;1503.
18. Méndez J.M., Ramírez E., Gaona Couto A. Diam. Relat. Mater. 7:1998;1184.
19. Ullmann J., Heyden D., Schwarz G., Wolf G.K., Baba K., Hatada R. Surf. Coat. Technol. 97:1997;281.
20. Friedmann T.A., McCarty K.F., Klaus E.J., Barbour J.C., Clift W.M., Johnsen H.A., Medlin D.L., Mills M.J., Ottesen D.K. Thin Solid Films. 237:1994;48.
21. Dworschak W., Jung J., Ehrhardt H. Thin Solid Films. 254:1995;65.
22. Chen G., Zhang X., Wang B., Yan H. Surf. Coat. Technol. 113:1999;25.
23. Thurer K.-H., Schreck M., Stritzker B. Phys. Rev. B57:1998;15454.
24. Zhang W.J., Jiang X., Xia Y.B. J. Appl. Phys. 82:1997;1896.
25. Lynch R.W., Drickamer H.G. J. Chem. Phys. 44:1966;181.
26. McKenzie D.R. J. Vac. Sci. Technol. 11:1993;1928.
27. McKenzie D.R., McFall W.D., Sainty W.G., Davis C.A., Collins R.E. Diam. Relat. Mater. 2:1993;970.
28. Verwoerd W.S. Thin Solid Films. 300:1997;78.
29. Hartman P. Sunagawa I. Morphology of Crystals (Pt. A). 1987;269-319 Terra Scientific Publishing Company, Tokyo. (Chapter 4).
30. Carter G. Vacuum. 56:2000;87.