Development of a novel high optical quality ZnO thin films by PLD for III-V opto-electronic devices

Current Applied Physics

Volumn 6, Issue 1, 2006, Pages 103-108

  Ramamoorthy, K ^a   Sanjeeviraja, C ^a   Jayachandran, M ^b   Sankaranarayanan, K ^a   Misra, Pankaj ^c   Kukreja, L M ^c  

^a ALAGAPPA UNIVERSITY   (India)

^b CENTRAL ELECTROCHEMICAL RESEARCH INSTITUTE   (India)

^c RAJA RAMANNA CENTRE FOR ADVANCED TECHNOLOGY   (India)

Author keywords

Laser epitaxy; Optical materials; Semiconducting materials; Solar cells; Thin film structure and morphology

Indexed keywords

DATA ACQUISITION; ELECTRIC CONDUCTIVITY; INDIUM COMPOUNDS; OPTICAL MATERIALS; PHOTOLUMINESCENCE; PULSED LASER DEPOSITION; SEMICONDUCTOR MATERIALS; SOLAR CELLS; ZINC OXIDE;

INDIUM TIN OXIDE (ITO); LASER EPITAXY; THIN FILM STRUCTURE AND MORPHOLOGY; TRANSPARENT CONDUCTING OXIDE (TCO);

THIN FILMS;

EID: 27544449814     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2004.12.010     Document Type: Article

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