Zone-plate-array lithography: A low-cost complement or competitor to scanning-electron-beam lithography

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 956-961

  Smith, Henry I ^a,b   Menon, Rajesh ^a,b   Patel, Amil ^a   Chao, David ^a   Walsh, Michael ^b   Barbastathis, G ^a,b  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b LumArray Inc   (United States)

Author keywords

Maskless lithography; Zone plate array lithography

Indexed keywords

COST EFFECTIVENESS; DATA TRANSFER; MASKS; OPTICAL RESOLVING POWER; PHOTONS; SCANNING;

ELECTRON-BEAM SYSTEMS; MASKLESS LITHOGRAPHY; PHOTON-BASED SYSTEMS; ZONE-PLATE-ARRAY LITHOGRAPHY;

ELECTRON BEAM LITHOGRAPHY;

EID: 33646031805     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.226     Document Type: Article

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