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Volumn 53, Issue 4, 2006, Pages 910-913

Underlap DGMOS for digital-subthreshold operation

Author keywords

Subthreshold operation; Ultralow power operation; Underlap double gate MOS (DGMOS)

Indexed keywords

ADDERS; DIGITAL CIRCUITS; GATES (TRANSISTOR); OPTIMIZATION; PERFORMANCE; POWER ELECTRONICS; SEMICONDUCTOR DEVICE STRUCTURES;

EID: 33645748445     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2006.870271     Document Type: Article
Times cited : (63)

References (10)
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  • 3
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    • J. Kim and K. Roy, "Double gate-MOSFET subthreshold circuit for ultralow power applications," IEEE Trans. Electron Devices, vol. 51, no. 9, pp. 1468-1474, Sep. 2004.
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    • Kim, J.1    Roy, K.2
  • 5
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    • "A simple model for the overlap capacitance of a VLSI MOS device"
    • Dec
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    • "Modeling and optimization of fringe capacitance of nanoscale DGMOS devices"
    • Feb
    • A. Bansal, B. C. Paul, and K. Roy, "Modeling and optimization of fringe capacitance of nanoscale DGMOS devices," IEEE Trans. Electron Devices, vol. 52, no. 2, pp. 256-262, Feb. 2005.
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  • 7
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    • May
    • J. G. Fossum, L. Ge, and M.-H. Chiang, "Speed superiority of scaled double gate CMOS," IEEE Trans. Electron Devices, vol. 49, no. 5, pp. 808-811, May 2002.
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  • 9
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    • Newport Beach, CA
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.