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Volumn 52, Issue 2, 2005, Pages 256-262

Modeling and optimization of fringe capacitance of nanoscale DGMOS devices

Author keywords

Conformal mapping; Double gate MOSFET; Fringe capacitance; Gate underlap

Indexed keywords

CAPACITANCE; CONFORMAL MAPPING; ELECTRODES; MATHEMATICAL MODELS; NANOTECHNOLOGY; OPTIMIZATION; OSCILLATORS (ELECTRONIC);

EID: 13344270339     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2004.842713     Document Type: Article
Times cited : (190)

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  • 3
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    • (2004) Proc. IEEE SOI Conf. , pp. 94-95
    • Bansal, A.1    Paul, B.C.2    Roy, K.3
  • 7
    • 13344249864 scopus 로고    scopus 로고
    • "Source/drain-doping engineering for optimal nanoscale FinFET design"
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    • June
    • S. Hasan, J. Wang, and M. Lundstrom, "Device design and manufacturing issues for 10 nm-scale MOSFETS: A computational study," Solid State Electron., vol. 48, pp. 867-875, June 2004.
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    • Jan
    • H. Lee, J. Lee, and H. Shin, "DC and AC characteristics of sub-50 nm MOSFETs with source/drain-to-gate nonoverlapped structure," IEEE Trans. Nanotechnol., vol. 1, no. 1, pp. 219-225, Jan. 2002.
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  • 14
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    • "Voltage dependent gate capacitance and its impact in estimating power and delay of CMOS digital circuits"
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.