Diffractive lenses for high resolution laser based failure analysis

Conference Proceedings from the International Symposium for Testing and Failure Analysis

Volumn 2005, Issue , 2005, Pages 1-7

  Zachariasse, Frank ^a   Goossens, Martijn ^b  

^a NXP SEMICONDUCTORS   (Netherlands)

^b PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

FAILURE ANALYSIS; OPTICAL RESOLVING POWER; PROBLEM SOLVING; SCANNING;

DIFFRACTIVE LENSES; HIGH RESOLUTION LASER; LASER SCANNING; LATERAL RESOLUTION;

LENSES;

EID: 33645663585     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)

1. Rowlette, J.A and Eiles, T.M., "Critical timing analysis in microprocessors using near-IR Laser assisted device alteration (LADA)", Proc. ITC, 2003, pp.264-273
2. Bruce, M. et al., "Soft defect localization on ICs", Proc. ISTFA 2002, pp. 21-27
3. Goruganthu, R.R. et al., "Spray Cooling for Time Resolved Emission Measurements of ICs", Proc. ISTFA 2004, pp. 18-23
4. Koyama, T. et al., "High Resolution Backside Fault Isolation Technique Using Directly Forming Si Substrate into Solid Immersion Lens", Proc. IRPS 2003, pp. 529-535
5. Falk, R.A. "Optimizing Backside Image Quality", Proc. ISTFA 2002, pp.156-161
6. R.Brunner et al., "Diffraction-based solid immersion lens", J. Opt. Soc. Am. A, Vol. 21, No. 7, July 2004, p. 1186
7. See for example M.Bass (Editor) "Handbook of Optics", Vol. 2, Chapter 8. McGraw-Hill, New York
8. Zachariasse, F, and Walker, J.F., "Direct write patterning of titanium films using focused ion beam implantation and plasma etching", Microelectronic Engineering Vol. 35, (1997) pp. 63-66