Enhancement of surface productions of CFx radicals by the addition of H2 into CF4 plasmas

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 38, Issue 8 B, 1999, Pages

  Sasaki, Koichi ^a   Furukawa, Hiroyuki ^a   Suzuki, Chihiro ^a   Kadota, Kiyoshi ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION; DISSOCIATION; FLUORINE COMPOUNDS; FREE RADICALS; HYDROGEN; LASER APPLICATIONS; PLASMAS; SURFACE CHEMISTRY;

DIFFUSION FLUXES; FLUOROCARBON FILM; FLUOROCARBON PLASMA; FLUOROCARBON RADICALS; LASER INDUCED FLUORESCENCE; PLASMA COLUMN; SURFACE PRODUCTION;

PLASMA DENSITY;

EID: 0033173997     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.l954     Document Type: Article

References (21)