Hydrogen doping of ZnO:Al films deposited by pulsed DC-sputtering of ceramic targets

Proceedings, Annual Technical Conference - Society of Vacuum Coaters

Volumn , Issue , 2005, Pages 302-307

  Ruske, F ^a   Sittinger, V ^a   Werner, W ^a   Szyszka, B ^a   Van Osten, K U ^b   Dietrich, K ^b   Rix, R ^b  

^a FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

^b GfE Metalle und Materialien GmbH   (Germany)

Author keywords

Hydrogen; Soutter deoosition; Transparent conductive coating; Zinc oxide

Indexed keywords

DOPING (ADDITIVES); ELECTRIC RESISTANCE; HYDROGEN; MAGNETRON SPUTTERING; X RAY DIFFRACTION;

ROOM TEMPERATURE; TRANSPARENT/CONDUCTIVE COATING;

ZINC OXIDE;

EID: 33644987396     PISSN: 07375921     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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