Self-consistent particle modeling of inductively coupled CF4 plasmas: Effect of wafer biasing

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 3 A, 2006, Pages 1805-1812

  Takekida, Hideto ^a   Nanbu, Kenichi ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Fluorocarbon plasma; Inductively coupled plasma; Particle modeling; Particle in cell Monte Carlo method

Indexed keywords

COMPUTER SIMULATION; IONS; PARTICLES (PARTICULATE MATTER); PLASMAS;

FLUOROCARBON PLASMA; PARTICLE MODELING; PARTICLE-IN-CELL/MONTE CARLO METHOD;

INDUCTIVELY COUPLED PLASMA;

EID: 33644931949     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.1805     Document Type: Article

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