Atomic force microscopy of thin organic films on silicon in ultrahigh vacuum and under ambient conditions

Surface and Interface Analysis

Volumn 33, Issue 2, 2002, Pages 85-88

  Reiniger, M ^a,b   Basnar, B ^a   Friedbacher, G ^a   Schleberger, M ^a  

^a UNIVERSITY OF OSNABRÜCK   (Germany)

^b VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

Atomic force microscopy; Self assembled monolayers

Indexed keywords

DAMPING; FILM GROWTH; FILM PREPARATION; MOLECULAR STRUCTURE; MONOLAYERS; NANOSTRUCTURED MATERIALS; PHYSICAL VAPOR DEPOSITION; SELF ASSEMBLY; SEMICONDUCTING SILICON COMPOUNDS; SURFACE TOPOGRAPHY; THIN FILMS; ULTRAHIGH VACUUM;

ALKYL CHAINS; CONTACT MODE; OCTADECYL SILOXANE ISLANDS; OCTADECYLTRICHLOROSILANE; SELF ASSEMBLED MONOLAYERS; TAPPING MODE; THIN ORGANIC FILMS;

ATOMIC FORCE MICROSCOPY;

EID: 0036471288     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.1167     Document Type: Article

References (17)