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Volumn 179, Issue , 2006, Pages 45-55

Aluminum nitride dielectrics for high energy density capacitors

Author keywords

[No Author keywords available]

Indexed keywords

BREAKDOWN STRENGTH; CAPACITOR DEVICES; ENERGY DENSITY CAPACITORS; PROCESS PARAMETERS;

EID: 33644801234     PISSN: 10421122     EISSN: None     Source Type: Book Series    
DOI: None     Document Type: Conference Paper
Times cited : (4)

References (12)
  • 1
    • 0036819797 scopus 로고    scopus 로고
    • Status quo and future prospects for metallized polypropolene energy storage capacitors
    • M. Rabuffi and G. Picci. "Status quo and future prospects for metallized polypropolene energy storage capacitors," IEEE Trans. Plasma Sci., 30, 1939-42 (2002).
    • (2002) IEEE Trans. Plasma Sci. , vol.30 , pp. 1939-1942
    • Rabuffi, M.1    Picci, G.2
  • 4
    • 1842427341 scopus 로고    scopus 로고
    • Thickness dependence of the properties of highly c-axis textured AlN thin films
    • F. Martin, P. Muralt, M.-A. Dubois, and A. Pezous. "Thickness dependence of the properties of highly c-axis textured AlN thin films." J. Vac. Sci. Technol. A, 22, 361-5 (2004).
    • (2004) J. Vac. Sci. Technol. A , vol.22 , pp. 361-365
    • Martin, F.1    Muralt, P.2    Dubois, M.-A.3    Pezous, A.4
  • 7
    • 0033285750 scopus 로고    scopus 로고
    • Optical and dielectric properties of dc magnetron sputtered AlN thin films correlated with deposition conditions
    • V. Dimitrova, D. Manova, and E. Valcheva. "Optical and dielectric properties of dc magnetron sputtered AlN thin films correlated with deposition conditions." Mater. Sci. Eng. B 68, 1-4 (1999).
    • (1999) Mater. Sci. Eng. B , vol.68 , pp. 1-4
    • Dimitrova, V.1    Manova, D.2    Valcheva, E.3
  • 8
    • 0032122139 scopus 로고    scopus 로고
    • Magnetron sputtering of aluminum using oxygen or nitrogen as reactive gas
    • J. Schulte and G. Sobe. "Magnetron sputtering of aluminum using oxygen or nitrogen as reactive gas." Thin Solid Films, 324 (1998): 19-24.
    • (1998) Thin Solid Films , vol.324 , pp. 19-24
    • Schulte, J.1    Sobe, G.2
  • 10
    • 0032370406 scopus 로고    scopus 로고
    • Structural characteristics of AlN films deposited by pulsed laser deposition and reactive magnetron sputtering: A comparative study
    • K. Jagannadham, K. Sharma, Q. Wei, R. Kalyanraman, and J. Narayan. "Structural characteristics of AlN films deposited by pulsed laser deposition and reactive magnetron sputtering: A comparative study." J. Vac. Sci. Technol. A 16, 2804-15 (1998).
    • (1998) J. Vac. Sci. Technol. A , vol.16 , pp. 2804-2815
    • Jagannadham, K.1    Sharma, K.2    Wei, Q.3    Kalyanraman, R.4    Narayan, J.5
  • 11
    • 3042615298 scopus 로고    scopus 로고
    • Nearly amorphous to epitxial growth of aluminum nitride films
    • T.T. Leung and C.W. Ong. "Nearly amorphous to epitxial growth of aluminum nitride films," Diamond Rel. Mater. 13, 1603-8 (2004).
    • (2004) Diamond Rel. Mater. , vol.13 , pp. 1603-1608
    • Leung, T.T.1    Ong, C.W.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.