A process model for sputter deposition of thin films using molecular dynamics

Thin Films

Volumn 22, Issue C, 1996, Pages

  Fang, C C ^a   Prasad, V ^a   Joshi, R V ^b   Jones, F ^b   Hsieh, J J ^b  

^a STONY BROOK UNIVERSITY   (United States)

^b IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 3142722573     PISSN: 10794050     EISSN: None     Source Type: Book Series    
DOI: 10.1016/S1079-4050(96)80005-6     Document Type: Article

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