Phase transformation of Si upon epitaxial CVD growths of β-SiC layer on Si substrates

Physica Status Solidi (A) Applications and Materials Science

Volumn 203, Issue 3, 2006, Pages 513-517

  Zhu, W L ^a   Zhu, J L ^a   Wan, K S ^a   Nishino, S ^a   Pezzotti, G ^a  

^a KYOTO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

MICROPIPES; SILICON SUBSTRATES;

CHEMICAL VAPOR DEPOSITION; EPITAXIAL GROWTH; PHASE TRANSITIONS; RAMAN SPECTROSCOPY; STRESS ANALYSIS; STRESS RELAXATION; SUBSTRATES;

SILICON;

EID: 33644660492     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200521396     Document Type: Article

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