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Semiconductor Science and Technology

Volumn 16, Issue 5, 2001, Pages 345-352

Raman microspectroscopy analysis of pressure-induced metallization in scratching of silicon

(4) Gogotsi, Yury a Zhou, Guohui b Ku, Sang Song b Cetinkunt, Sabri b

a Drexel University (United States)

b 1120 Science and Engineering Offices (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ELECTRON MICROSCOPY; METALLIZING; MICROMACHINING; MIXTURES; PRESSURE EFFECTS;

RAMAN MICROSPECTROSCOPY; SCRATCH TESTS; SINGLE POINT DIAMOND TURNING MACHINE;

SILICON WAFERS;

EID: 0035326792 PISSN: 02681242 EISSN: None Source Type: Journal
DOI: 10.1088/0268-1242/16/5/311 Document Type: Article

Times cited : (135)

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