Bis(fluoroalcohol) monomers and polymers: Improved transparency fluoropolymer photoresists for semiconductor photolithography at 157 nm

Macromolecules

Volumn 39, Issue 4, 2006, Pages 1443-1448

  Feiring, Andrew E ^a   Crawford, Michael K ^a   Farnham, William B ^a   French, Roger H ^a   Leffew, Kenneth W ^a   Petrov, Viacheslav A ^a   Schadt III, Frank L ^a   Tran, Hoang V ^a   Zumsteg, Fredrick C ^a  

^a DUPONT COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

NORBORNENE RING; PHOTORESIST POLYMERS;

ALCOHOLS; COPOLYMERS; FLUORINE CONTAINING POLYMERS; MOLECULAR WEIGHT; PHOTORESISTS; POLYMERIZATION;

MONOMERS;

EID: 33644633336     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma051984l     Document Type: Article

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