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Volumn 5992, Issue 1, 2005, Pages

Model-based insertion and optimization of assist features with application to contact layers

Author keywords

Contact layers; Mask Inversion; Mask Optimization; Mask Simplification; Optical Proximity Correction (OPC); Process window; Resolution enhancement techniques (RET); Sub Resolution Assist Feature (SRAF)

Indexed keywords

CONTACT LAYERS; MASK INVERSION; MASK OPTIMIZATION; MASK SIMPLIFICATION; OPTICAL PROXIMITY CORRECTION (OPC); PROCESS WINDOW; RESOLUTION ENHANCEMENT TECHNIQUES (RET); SUB-RESOLUTION ASSIST FEATURE (SRAF);

EID: 33644602459     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.632345     Document Type: Conference Paper
Times cited : (20)

References (7)
  • 1
    • 25144486100 scopus 로고    scopus 로고
    • Solving inverse problems of optical microlithography
    • Granik, "Solving inverse problems of optical microlithography", Proc. SPIE vol. 5754 (2005) pp. 506-526
    • (2005) Proc. SPIE , vol.5754 , pp. 506-526
    • Granik1
  • 2
    • 25144445271 scopus 로고    scopus 로고
    • The problem of optimal placement if sub-resolution assist features (SRAF)
    • Mukherjee et al, "The problem of optimal placement if sub-resolution assist features (SRAF)", Proc. SPIE vol. 5754 (2005) pp. 1417-1429
    • (2005) Proc. SPIE , vol.5754 , pp. 1417-1429
    • Mukherjee1
  • 3
    • 0036415723 scopus 로고    scopus 로고
    • Contrast-based assist feature optimization
    • Torres et al, "Contrast-based assist feature optimization", Proc. SPIE vol. 4691 (2002) pp. 179-188
    • (2002) Proc. SPIE , vol.4691 , pp. 179-188
    • Torres1
  • 4
    • 0242441452 scopus 로고    scopus 로고
    • Model-assisted placement of sub-resolution assist features: Experimental results
    • Brist et al, "Model-assisted placement of sub-resolution assist features: experimental results", Proc. SPIE vol. 5042 (2003) pp. 99-106
    • (2003) Proc. SPIE , vol.5042 , pp. 99-106
    • Brist1
  • 5
    • 19944427623 scopus 로고    scopus 로고
    • Contact hole reticle optimization by using interference mapping lithography (IML™)
    • Sosha et al, "Contact hole reticle optimization by using interference mapping lithography (IML™)", Proc. SPIE vol. 5446 (2004) pp. 516-524
    • (2004) Proc. SPIE , vol.5446 , pp. 516-524
    • Sosha1
  • 6
    • 28544436266 scopus 로고    scopus 로고
    • A Proposal for the contact hole assist feature printing checker in IML™
    • Shieh, etc al, "A Proposal for the contact hole assist feature printing checker in IML™", Proc. SPIE vol. 5853 (2005) pp. 672-677
    • (2005) Proc. SPIE , vol.5853 , pp. 672-677
    • Shieh1
  • 7
    • 25144453794 scopus 로고    scopus 로고
    • Integrated circuit DFM framework for deep sub-wavelength processes
    • J.A. Torres, C.N. Berglund "Integrated circuit DFM framework for deep sub-wavelength processes". Proc. SPIN Vol. 5756 (2005), pp.39-50
    • (2005) Proc. SPIN , vol.5756 , pp. 39-50
    • Torres, J.A.1    Berglund, C.N.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.