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Volumn 5992, Issue 1, 2005, Pages
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Model-based insertion and optimization of assist features with application to contact layers
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Author keywords
Contact layers; Mask Inversion; Mask Optimization; Mask Simplification; Optical Proximity Correction (OPC); Process window; Resolution enhancement techniques (RET); Sub Resolution Assist Feature (SRAF)
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Indexed keywords
CONTACT LAYERS;
MASK INVERSION;
MASK OPTIMIZATION;
MASK SIMPLIFICATION;
OPTICAL PROXIMITY CORRECTION (OPC);
PROCESS WINDOW;
RESOLUTION ENHANCEMENT TECHNIQUES (RET);
SUB-RESOLUTION ASSIST FEATURE (SRAF);
IMAGE ANALYSIS;
OPTICAL RESOLVING POWER;
OPTIMIZATION;
PHOTOLITHOGRAPHY;
MASKS;
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EID: 33644602459
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.632345 Document Type: Conference Paper |
Times cited : (20)
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References (7)
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