A proposal for the contact hole assist feature printing checker in IML™

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5853 PART II, Issue , 2005, Pages 672-677

  Shieh, Jason ^a   Socha, Robert ^b   Shi, Xuelong ^b   Chen, Alek ^a  

^a ASML Taiwan Ltd   (Taiwan)

^b ASML US Inc   (United States)

Author keywords

Assist feature; Attenuated phase shift mask; Contact hole; Resolution enhancement

Indexed keywords

INTERFERENCE MAPPING LITHOGRAPHY (IML); OPTICAL IMAGING SOLUTION;

ATTENUATION; PHASE SHIFT;

LITHOGRAPHY;

EID: 28544436266     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.617191     Document Type: Conference Paper

References (3)

1. 'Contact hole reticle optimization by using Interference Mapping Lithography (IML™)', R. Socha, D. Van Den Broeke, S. Hsu, J. F. Chen, T. Laidig, N. Corcoran, U. Hollerbach, K.E. Wampler, X. Shi, W. Conley, Proc. SPIE 5377-20.
2. 'Application of CPL with Interference Mapping Technology™ to generate random contact reticle designs for the 65-nm node', D.J. Van Den Broke, T.L. Laidig, J.F. Chen, K.E. Wampler, S.D. Hsu, X. Shi, R.J. Socha, M.V. Dusa, N.P. Corcoran, Proc. SPIE 5446-62.
3. 'Method to improve the resolution of contact holes', G. Kunkel, R. Ziebold, Proc. SPIE 5377-21.