Formation and evolution of strain-induced self-assembled dot

Microelectronics Journal

Volumn 36, Issue 3-6, 2005, Pages 216-218

  Hanada, Takashi ^a   Yao, Takafumi ^a,b  

^a TOHOKU UNIVERSITY   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

Author keywords

Diffusion length; Energetics; Lattice misfit; Self assembled dot

Indexed keywords

DIFFUSION; EPITAXIAL GROWTH; INTERFACIAL ENERGY; SELF ASSEMBLY; STRAIN; THERMAL EFFECTS;

DIFFUSION LENGTH; ENERGETICS; LATTICE MISFIT; SELF-ASSEMBLED DOTS;

SEMICONDUCTOR QUANTUM DOTS;

EID: 33644529732     PISSN: 00262692     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mejo.2005.02.009     Document Type: Conference Paper

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