Contact characteristics of silicon and Indium Tin Oxide (ITO) in polysilicon thin-film transistors

Journal of the Korean Physical Society

Volumn 48, Issue SUPPL. 1, 2006, Pages

  Park, Won Kyu ^a,b   Kang, Yoonmook ^a   Kim, Donghwan ^a  

^a Korea University   (South Korea)

^b Korea Advanced Nano Fab Center (KANC)   (South Korea)

Author keywords

Contact resistance; Indium tin oxide; Polycrystalline silicon TFT

Indexed keywords

EID: 33644525673     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

References (18)

1. K. Ono, T. Suzuki, H. Sakuta, K. Onisawa, M. Hiroshima, T. Sasaki, M. Tsumura and N. Konishi, IEICE Trans. Electron E39-C, 8 (1996).
2. Min-Woo Ha, Byung-Chul Jeon, Min-Koo Han and Yearn-Ik Choi, J. Korean Phys. Soc. 44, 172 (2004).
3. S. H. Lee, J. Korean Phys. Soc. 39, 369 (2001).
4. D. G. Lim, I. Lee and J. Yi, J. Korean Phys. Soc. 39, 41 (2001).
5. J. W. Bae, H. C. Lee and G. Y. Yeom, J. Korean Phys. Soc. 47, 889 (2005).
6. Y. Ugai, T. Yukawa, Y. Hatta and S. Aoki. Jpn. J. Appl. Phys. 35, L1027 (1996).
7. H. Ryu, J. Kang, Y. Han, D. Kim, J. J. Pak, W. K. Park and M. S. Yang, J. Elec. Mat. 32, 919 (2003).
8. A. Ban, Y. Nishioka, T. Shimada, M. Okamoto and M. Katayama, Digest Soc. Inform. Display 93 (1996).
9. B.-S. Chiou and K.-L. Wu, J. of Materials Science: Materials in Electronics 9, 151 (1998).
10. H. Yabuhara and Y. Kataoka. Jpn. J. Appl. Phys. 38, 5232 (1999).
11. M. C. G. Passeggi, Jr., L. I. Vergara, S. M. Mendoza and J. Perron, Surf. Sci. 507-510, 825 (2002).
12. J. S. Hwang, D. Ahn, S. H. Hong, H. K. Kim, S. W. Hwang, B. H. Jeon and J. H. Choi, Appl. Phys. Lett. 85, 1636 (2004).
13. th Korea Semiconductor Conference Proceedings 449 (1999).
14. K. Maex and M. V. Rossum, Properties of Metal Silicides 103 (1995).
15. K. Yokota, K. Nakamura, T. Sasakawa and T. Kamatani, Jpn. J. Appl. Phys. 40, 718 (2001).
16. R. A. Swalin, Thermodynamics of Solids 116 (1972).
17. S. M. Jung, G. S. Chang, K. H. Chae, J. K. Kim, S. O. Kim, J. J. Woo and C. N. Whang, J. Korean Phys. Soc. 27, 572 (1994).
18. K. L. Chopra, S. Major and D. K. Pandya, Thin Solids Films 102, 1 (1983).