A 24 cm diagonal TFT-LCD fabricated using a simplified, four-photolithographic mask process

IEICE Transactions on Electronics

Volumn E79-C, Issue 8, 1996, Pages 1097-1102

  Ono, Kikuo ^a   Suzuki, Takashi ^a   Sakuta, Hiroki ^a   Onisawa, Kenichi ^a   Hiroshima, Minoru ^a   Sasaki, Tooru ^a   Tsumura, Makoto ^a   Konishi, Nobutake ^a  

^a HITACHI LTD   (Japan)

Author keywords

Amorphous silicon; Liquid crystal display; Silicide; Thin film transistors

Indexed keywords

AMORPHOUS SILICON; DRY ETCHING; ELECTRIC RESISTANCE; ETCHING; FABRICATION; IMAGE QUALITY; MASKS; PHOTOLITHOGRAPHY; SILICON COMPOUNDS; THIN FILM TRANSISTORS;

DOT INVERSION DRIVING METHOD; INDIUM TIN OXIDE; SILICIDATION; SILICIDE; VIDEO GRAPHIC ARRAY;

LIQUID CRYSTAL DISPLAYS;

EID: 0030219433     PISSN: 09168524     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (11)

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