Ultra low sheet resistance on poly silicon film by excimer laser activation

Journal of the Korean Physical Society

Volumn 48, Issue SUPPL. 1, 2006, Pages

  Lim, Huck ^a   Yin, Huaxing ^a   Xianyu, Wenxu ^a   Kwon, Jang Yeon ^a   Zhang, Xiaoxin ^a   Cho, Hans S ^a   Kim, Jong Man ^a   Park, Kyung Bae ^a   Kim, Do Young ^a   Jung, Ji Sim ^a   Noguchi, Takashi ^a,b  

^a Samsung Advanced Institute of Technology (SAIT)   (South Korea)

^b Sungkyunkwan University   (South Korea)

Author keywords

Activation; Laser; Phosphorus; Poly silicon

Indexed keywords

EID: 33644517525     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

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