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Volumn 37, Issue 6, 2000, Pages 870-872

Polycrystalline silicon thin film transistors fabricated by employing selective self ion-implantation and excimer laser annealing

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EID: 0034347668     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: 10.3938/jkps.37.870     Document Type: Article
Times cited : (12)

References (5)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.