-
3
-
-
0242552155
-
Recent advances on electromigration in very-large-scale-integration of interconnects
-
K.N. Tu: Recent advances on electromigration in very-large-scale-integration of interconnects, J. Appl. Phys. 94, 5451 (2003).
-
(2003)
J. Appl. Phys.
, vol.94
, pp. 5451
-
-
Tu, K.N.1
-
4
-
-
0002334929
-
Electromigration studies of flip chip bump solder joints
-
San Jose, CA (SMTA, Edina MN)
-
S. Brandenburg and S. Yeh: Electromigration studies of flip chip bump solder joints, in Proceedings of Surface Mount International Conference and Exhibition, San Jose, CA (SMTA, Edina MN 1998), p. 337.
-
(1998)
Proceedings of Surface Mount International Conference and Exhibition
, pp. 337
-
-
Brandenburg, S.1
Yeh, S.2
-
5
-
-
0032614180
-
Microstructure-electromigration correlation in a thin strips of eutectic SnPb solder stressed between Cu electrodes
-
C.Y. Liu, C. Chen, C.N. Liao, and K.N. Tu: Microstructure-electromigration correlation in a thin strips of eutectic SnPb solder stressed between Cu electrodes. Appl. Phys. Lett. 75, 58 (1999).
-
(1999)
Appl. Phys. Lett.
, vol.75
, pp. 58
-
-
Liu, C.Y.1
Chen, C.2
Liao, C.N.3
Tu, K.N.4
-
6
-
-
1842617942
-
Electromigration in metals
-
P.S. Ho and T. Kwok: Electromigration in metals, Rep. Prog. Phys. 52, 301 (1989).
-
(1989)
Rep. Prog. Phys.
, vol.52
, pp. 301
-
-
Ho, P.S.1
Kwok, T.2
-
7
-
-
0031695978
-
Copper interconnections and reliability
-
C.K. Hu and J.M.E. Harper: Copper interconnections and reliability. Mater. Chem. Phys. 52, 5 (1998).
-
(1998)
Mater. Chem. Phys.
, vol.52
, pp. 5
-
-
Hu, C.K.1
Harper, J.M.E.2
-
8
-
-
79958223410
-
Current-crowding-induced electromigration failure in flip chip solder joints
-
E.C.C. Yeh, W.J. Choi, and K.N. Tu: Current-crowding-induced electromigration failure in flip chip solder joints. Appl. Phys. Lett. 80(4), 580 (2002).
-
(2002)
Appl. Phys. Lett.
, vol.80
, Issue.4
, pp. 580
-
-
Yeh, E.C.C.1
Choi, W.J.2
Tu, K.N.3
-
9
-
-
0242721171
-
Mean-time-to-failure study of flip chip solder joints on Cu/Ni(V)/Al thin-film under-bump-metallization
-
W.J. Choi, ECC. Yeh, and K.N. Tu: Mean-time-to-failure study of flip chip solder joints on Cu/Ni(V)/Al thin-film under-bump-metallization. J. Appl. Phys. 94, 5665 (2003).
-
(2003)
J. Appl. Phys.
, vol.94
, pp. 5665
-
-
Choi, W.J.1
Yeh, E.C.C.2
Tu, K.N.3
-
10
-
-
0346935270
-
Mechanism of electromigration-induced failure in the 97Pb-3Sn and 37Pb-63Sn composite solder joints
-
J.W. Nah, K.W. Paik, and J.O. Suh: Mechanism of electromigration-induced failure in the 97Pb-3Sn and 37Pb-63Sn composite solder joints. J. Appl. Phys. 94, 7560 (2003).
-
(2003)
J. Appl. Phys.
, vol.94
, pp. 7560
-
-
Nah, J.W.1
Paik, K.W.2
Suh, J.O.3
-
11
-
-
10444248743
-
y flip chip interconnects
-
(IEEE, New York)
-
y flip chip interconnects, in 2004 Electronic Components and Technology Conference, (IEEE, New York) p. 961.
-
2004 Electronic Components and Technology Conference
, pp. 961
-
-
Wu, J.D.1
Lee, C.W.2
Zheng, P.J.3
Lee, J.C.B.4
Li, S.5
-
12
-
-
10044228341
-
-
T.L. Shao, S.H. Chiu, C. Chen, D.J. Yao, and C.Y. Hsu: J. Electron. Mater. 33, 1350 (2004).
-
(2004)
J. Electron. Mater.
, vol.33
, pp. 1350
-
-
Shao, T.L.1
Chiu, S.H.2
Chen, C.3
Yao, D.J.4
Hsu, C.Y.5
-
13
-
-
0034835758
-
A study of electromigration in 3D flip chip solder joint using numerical simulation of heat flux and current density
-
T.Y. Tom Lee, T.Y. Lee, and K.N. Tu: A study of electromigration in 3D flip chip solder joint using numerical simulation of heat flux and current density, in Proceedings of the 51th Electronic Components and Technology Conference, Packaging, and Manufacturing Technology Society, (2001), p. 558.
-
(2001)
Proceedings of the 51th Electronic Components and Technology Conference, Packaging, and Manufacturing Technology Society
, pp. 558
-
-
Tom Lee, T.Y.1
Lee, T.Y.2
Tu, K.N.3
-
14
-
-
3142599527
-
3Sn intermetallics in high-lead 95Pb5Sn solder bumps on Cu under bump metallization during solid-state annealing
-
3Sn intermetallics in high-lead 95Pb5Sn solder bumps on Cu under bump metallization during solid-state annealing. J. Appl. Phys. 95, 8286 (2004).
-
(2004)
J. Appl. Phys.
, vol.95
, pp. 8286
-
-
Jang, J.W.1
Ramanathan, L.N.2
Lin, J.K.3
Frear, D.R.4
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