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Volumn 21, Issue 1, 2006, Pages 137-146

Relieving the current crowding effect in flip-chip solder joints during current stressing

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; COPPER; CURRENT DENSITY; ELECTRIC CONDUCTIVITY; FINITE ELEMENT METHOD; METALLIZING; THERMAL EFFECTS;

EID: 33644510097     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/jmr.2006.0004     Document Type: Article
Times cited : (26)

References (14)
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    • Recent advances on electromigration in very-large-scale-integration of interconnects
    • K.N. Tu: Recent advances on electromigration in very-large-scale-integration of interconnects, J. Appl. Phys. 94, 5451 (2003).
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    • Tu, K.N.1
  • 5
    • 0032614180 scopus 로고    scopus 로고
    • Microstructure-electromigration correlation in a thin strips of eutectic SnPb solder stressed between Cu electrodes
    • C.Y. Liu, C. Chen, C.N. Liao, and K.N. Tu: Microstructure-electromigration correlation in a thin strips of eutectic SnPb solder stressed between Cu electrodes. Appl. Phys. Lett. 75, 58 (1999).
    • (1999) Appl. Phys. Lett. , vol.75 , pp. 58
    • Liu, C.Y.1    Chen, C.2    Liao, C.N.3    Tu, K.N.4
  • 6
    • 1842617942 scopus 로고
    • Electromigration in metals
    • P.S. Ho and T. Kwok: Electromigration in metals, Rep. Prog. Phys. 52, 301 (1989).
    • (1989) Rep. Prog. Phys. , vol.52 , pp. 301
    • Ho, P.S.1    Kwok, T.2
  • 7
    • 0031695978 scopus 로고    scopus 로고
    • Copper interconnections and reliability
    • C.K. Hu and J.M.E. Harper: Copper interconnections and reliability. Mater. Chem. Phys. 52, 5 (1998).
    • (1998) Mater. Chem. Phys. , vol.52 , pp. 5
    • Hu, C.K.1    Harper, J.M.E.2
  • 8
    • 79958223410 scopus 로고    scopus 로고
    • Current-crowding-induced electromigration failure in flip chip solder joints
    • E.C.C. Yeh, W.J. Choi, and K.N. Tu: Current-crowding-induced electromigration failure in flip chip solder joints. Appl. Phys. Lett. 80(4), 580 (2002).
    • (2002) Appl. Phys. Lett. , vol.80 , Issue.4 , pp. 580
    • Yeh, E.C.C.1    Choi, W.J.2    Tu, K.N.3
  • 9
    • 0242721171 scopus 로고    scopus 로고
    • Mean-time-to-failure study of flip chip solder joints on Cu/Ni(V)/Al thin-film under-bump-metallization
    • W.J. Choi, ECC. Yeh, and K.N. Tu: Mean-time-to-failure study of flip chip solder joints on Cu/Ni(V)/Al thin-film under-bump-metallization. J. Appl. Phys. 94, 5665 (2003).
    • (2003) J. Appl. Phys. , vol.94 , pp. 5665
    • Choi, W.J.1    Yeh, E.C.C.2    Tu, K.N.3
  • 10
    • 0346935270 scopus 로고    scopus 로고
    • Mechanism of electromigration-induced failure in the 97Pb-3Sn and 37Pb-63Sn composite solder joints
    • J.W. Nah, K.W. Paik, and J.O. Suh: Mechanism of electromigration-induced failure in the 97Pb-3Sn and 37Pb-63Sn composite solder joints. J. Appl. Phys. 94, 7560 (2003).
    • (2003) J. Appl. Phys. , vol.94 , pp. 7560
    • Nah, J.W.1    Paik, K.W.2    Suh, J.O.3
  • 14
    • 3142599527 scopus 로고    scopus 로고
    • 3Sn intermetallics in high-lead 95Pb5Sn solder bumps on Cu under bump metallization during solid-state annealing
    • 3Sn intermetallics in high-lead 95Pb5Sn solder bumps on Cu under bump metallization during solid-state annealing. J. Appl. Phys. 95, 8286 (2004).
    • (2004) J. Appl. Phys. , vol.95 , pp. 8286
    • Jang, J.W.1    Ramanathan, L.N.2    Lin, J.K.3    Frear, D.R.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.